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G6機型是制造工藝中所用可高效、大容量處理各種氣體的燃燒式廢氣處理裝置。允許流入氣體量約為傳統機型的3倍,還能處理伴有高熱的大流量氫氣。通過能夠結合處理對象氣體種類和數量進行處理的可調式(燃料供應量可調)運行功能,能夠降低運行成本;通過大容量副產物捕集器等副產物處理措施,能夠降低大流量氣體處理時的維護成本,降低負荷。該裝置是半導體、液晶面板、太陽能電池和LED等電子元件制造以及化學材料工廠和各種研究室等用途的最佳選擇。
Model G6 is a combustion-type exhaust abatement system that is capable of highly efficient, large-volume treatment of various types of gasses. Inflow gas volume is three times larger than conventional models. Suited to the treatment of large flows of high-heat-generating hydrogen gas. Reduction of running costs achieved through on-demand operation with variable fuel volume to suit the type and volume of gas being abated. Byproduct countermeasures, such as large-capacity byproduct traps, achieve reductions in maintenance costs and load in the abatement of high flow-rate gases. Ideal for applications in the manufacturing operations of electric components such as semiconductors, LCD panels, solar cells, and LEDs, chemicals and materials manufacture, and research laboratories.
設備名稱 |
單位 |
G6 A1~A4 |
G6 P1~P4 |
處理方式 |
燃燒式+濕式 |
燃燒式+濕式 |
|
最大允許流入氣體量 |
L/min |
1200 |
1200 |
燃料 |
城市燃氣 |
丙烷氣體 |
|
尺寸 |
W
x D x H |
1,200x1,900x2,300 |
1,200x1,900x2,300 |
可處理氣體 |
工藝(沉積)氣體: |
工藝(沉積)氣體: |
|
標準裝備品 |
大流量NF3處理燃燒器 |
大流量NF3處理燃燒器 |
G6機型是制造工藝中所用可高效、大容量處理各種氣體的燃燒式廢氣處理裝置。允許流入氣體量約為傳統機型的3倍,還能處理伴有高熱的大流量氫氣。通過能夠結合處理對象氣體種類和數量進行處理的可調式(燃料供應量可調)運行功能,能夠降低運行成本;通過大容量副產物捕集器等副產物處理措施,能夠降低大流量氣體處理時的維護成本,降低負荷。該裝置是半導體、液晶面板、太陽能電池和LED等電子元件制造以及化學材料工廠和各種研究室等用途的最佳選擇。
Model G6 is a combustion-type exhaust abatement system that is capable of highly efficient, large-volume treatment of various types of gasses. Inflow gas volume is three times larger than conventional models. Suited to the treatment of large flows of high-heat-generating hydrogen gas. Reduction of running costs achieved through on-demand operation with variable fuel volume to suit the type and volume of gas being abated. Byproduct countermeasures, such as large-capacity byproduct traps, achieve reductions in maintenance costs and load in the abatement of high flow-rate gases. Ideal for applications in the manufacturing operations of electric components such as semiconductors, LCD panels, solar cells, and LEDs, chemicals and materials manufacture, and research laboratories.
設備名稱 |
單位 |
G6 A1~A4 |
G6 P1~P4 |
處理方式 |
燃燒式+濕式 |
燃燒式+濕式 |
|
最大允許流入氣體量 |
L/min |
1200 |
1200 |
燃料 |
城市燃氣 |
丙烷氣體 |
|
尺寸 |
W
x D x H |
1,200x1,900x2,300 |
1,200x1,900x2,300 |
可處理氣體 |
工藝(沉積)氣體: |
工藝(沉積)氣體: |
|
標準裝備品 |
大流量NF3處理燃燒器 |
大流量NF3處理燃燒器 |