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G6-E更適用于外延生長和其他半導體的制程中的氫氣和氯氣的處理。
Model G6-E is suited to the abatement of gases containing hydrogen and chlorine used for epitaxial growth and other systems in processes to manufacture semiconductors.
產品特點:
G6-E更適用于外延生長和其他半導體的制程中的氫氣和氯氣的處理。
Model G6-E is suited to the abatement of gases containing hydrogen and chlorine used for epitaxial growth and other systems in processes to manufacture semiconductors.
產品特點: